KIST Library Institutional Repository

형태학적　조절을　이용한　고성능　선택투과성을　가지는　열방성　액정고분자　복합　기체분리막

Author

서용석; 김광웅; 홍성욱; 황승상; 홍순만

Assignee

한국과학기술연구원

Regitration Date

2003-02-11

Registration No.

6,517,606

Application Date

2001-06-21

Application No.

09/886,604

Country

US

URI

https://pubs.kist.re.kr/handle/201004/82338

Appears in Collections:

KIST Patent > 2001

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