Measurement of particle deposition velocity toward a horizontal semiconductor wafer using a wafer surface scanner.

Title
Measurement of particle deposition velocity toward a horizontal semiconductor wafer using a wafer surface scanner.
Authors
배귀남박승오이춘식명현국신흥태
Keywords
particle deposition velocity; 입자의 침착속도; semiconductor wafer; 반도체 웨이퍼; convection; 대류; diffusion; 확산; sedimentation; 중력침강
Issue Date
1993-01
Publisher
공기조화·냉동공학 논문집
Citation
VOL 제 5 권, 130-140
URI
http://pubs.kist.re.kr/handle/201004/8243
Appears in Collections:
KIST Publication > Article
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