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기재 위에 h-BN 후막을 형성하는 방법 및 그로부터 제조된 h-BN 후막 적층체

Author

김수민; 김기강; 손장엽; 이승기; 이주송

Assignee

한국과학기술연구원

Regitration Date

2018-10-30

Registration No.

10,113,230

Application Date

2016-02-26

Application No.

15/055290

Country

US

URI

https://pubs.kist.re.kr/handle/201004/83378

Appears in Collections:

KIST Patent > 2016

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