Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | LEE, YEON HEE | - |
| dc.date.accessioned | 2024-01-12T09:41:41Z | - |
| dc.date.available | 2024-01-12T09:41:41Z | - |
| dc.date.created | 2022-01-14 | - |
| dc.date.issued | 2001-07-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/83824 | - |
| dc.title | The effect of plasma exposure and annealing ambient on shallow junction formation using PSII | - |
| dc.type | Conference | - |
| dc.description.journalClass | 2 | - |
| dc.identifier.bibliographicCitation | 한국진공학회, pp.0 | - |
| dc.citation.title | 한국진공학회 | - |
| dc.citation.startPage | 0 | - |
| dc.citation.endPage | 0 | - |
| dc.relation.isPartOf | 한국진공학회 학술발표회 - 직접입력 | - |
- Appears in Collections:
- KIST Conference Paper > 2001
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