Modification of PMMA for a deep UV photoresist : 1. Photodegradation of P(MMA-co-BOXM-co-TBMA).
- Modification of PMMA for a deep UV photoresist : 1. Photodegradation of P(MMA-co-BOXM-co-TBMA).
- 안광덕; 채규호; 황인동; 박서호
- deep UV photoresist; photodegradation of poly(methyl methacrylate); butanedione monooxime methacrylate; terpolymer; photosensitivity
- Issue Date
- 폴리머; Polymer(Korea)
- v. 16, no. 6, 669-679
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- KIST Publication > Article
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