Modification of PMMA for a deep UV photoresist : 1. Photodegradation of P(MMA-co-BOXM-co-TBMA).

Title
Modification of PMMA for a deep UV photoresist : 1. Photodegradation of P(MMA-co-BOXM-co-TBMA).
Authors
안광덕채규호황인동박서호
Keywords
deep UV photoresist; photodegradation of poly(methyl methacrylate); butanedione monooxime methacrylate; terpolymer; photosensitivity
Issue Date
1992-11
Publisher
폴리머; Polymer(Korea)
Citation
v. 16, no. 6, 669-679
URI
http://pubs.kist.re.kr/handle/201004/8388
Appears in Collections:
KIST Publication > Article
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