A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor.

Title
A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor.
Authors
안광덕강종희김성주박병선박찬언박춘근
Keywords
three component positive resist materials; deep UV resists; dry etch resistance; chemical amplification resists; dissolution inhibition resist; t-BOC protected phosphazene; novolac resin; photosensitivity
Issue Date
1992-01
Publisher
Journal of photopolymer science and technology
Citation
v. 5, no. 1, 67-78
URI
http://pubs.kist.re.kr/handle/201004/8427
Appears in Collections:
KIST Publication > Article
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