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dc.contributor.author변영태-
dc.contributor.author이석-
dc.contributor.author박화선-
dc.contributor.author우덕하-
dc.contributor.author이종창-
dc.date.accessioned2024-01-12T10:32:52Z-
dc.date.available2024-01-12T10:32:52Z-
dc.date.issued2006-05-02-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/84569-
dc.title높은 위상변조 효율을 갖는 InGaAsP/InPridge 도파로 위상 변조기의 에피박막층 제조방법-
dc.typePatent-
dc.date.registration2006-05-02-
dc.date.application2004-01-06-
dc.identifier.patentRegistrationNumber7,037,739-
dc.identifier.patentApplicationNumber10/751,858-
dc.publisher.countryUS-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2004
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