Chemical modification of PMIPK resist.

Title
Chemical modification of PMIPK resist.
Authors
안광덕
Keywords
poly(methyl isopropenyl ketone) [PMIPK]; PMIPK-oxime; photosensitizer; photosensitivity; photodegradation; side-chain modification; polymer reaction; photoresist
Issue Date
1990-01
Publisher
Polymers for microelectronics-science and technology
Citation
, 269-281
URI
http://pubs.kist.re.kr/handle/201004/8608
Appears in Collections:
KIST Publication > Article
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