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저온에서 SiO2 박막성형이 가능한 코팅소재 제조 및 필름형성 방법

Author

황승상; 홍순만; 이응찬; 구종민; 송선자; 백경열

Assignee

한국과학기술연구원

Regitration Date

2016-02-19

Registration No.

10-1597551

Application Date

2014-09-30

Application No.

2014-0131626

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/89277

Appears in Collections:

KIST Patent > 2014

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