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dc.contributor.author박한용-
dc.contributor.author김용수-
dc.contributor.author성하민-
dc.contributor.author김점술-
dc.contributor.author이승범-
dc.contributor.author조현우-
dc.contributor.author이주한-
dc.contributor.authorKim, Yong Tae-
dc.contributor.authorJhon, Young Min-
dc.date.accessioned2024-01-12T14:34:07Z-
dc.date.available2024-01-12T14:34:07Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/89318-
dc.languageEnglish-
dc.publisher4.6~8, 코엑스, 한국광학회-
dc.subjectEUV-
dc.subjectCSM-
dc.titleCSM(Coherent Scattering Microscope) system development for next generation EUV photomask inspection-
dc.title.alternative차세대 EUV 반도체 포토마스크 검사를 위한 CSM(Coherent Scattering Microscope) 시스템 개발-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation차세대 리소그래피 학술대회, no.F2-IV-2, pp.119 - 120-
dc.citation.title차세대 리소그래피 학술대회-
dc.citation.numberF2-IV-2-
dc.citation.startPage119-
dc.citation.endPage120-
dc.citation.conferencePlaceKO-
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