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고밀도의 압전 후막의 제조방법

Author

윤석진; 송현철; 김진상; 강종윤; 최지원

Assignee

한국과학기술연구원

Regitration Date

2011-08-22

Registration No.

1059750

Application Date

2009-09-03

Application No.

2009-0083182

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/89854

Appears in Collections:

KIST Patent > 2009

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