Tilt-axis effect on oxidation behavior and capacitance-voltage characteristics of (100) silicon

Title
Tilt-axis effect on oxidation behavior and capacitance-voltage characteristics of (100) silicon
Authors
H. J. WooD. J. Choi김긍호
Keywords
silicon; thermal oxidation; stacking fault; convergent beam electron diffraction; lattice strain; thermal strain
Issue Date
1997-11
Publisher
Journal of materials science
Citation
VOL 32, 6101-6106
URI
http://pubs.kist.re.kr/handle/201004/9279
ISSN
0022-2461
Appears in Collections:
KIST Publication > Article
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