100 ㎚ electron beam lithography using a modified scanning electron microscope.

Title
100 ㎚ electron beam lithography using a modified scanning electron microscope.
Authors
김성일민석기김은규최범호황성우정석구김태근
Keywords
MOCVD
Issue Date
1996-01
Publisher
Bulletin of the Korean physical society
Citation
v. 14, no. 2, 539-?
URI
http://pubs.kist.re.kr/handle/201004/9389
Appears in Collections:
KIST Publication > Article
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