Full metadata record

DC Field Value Language
dc.contributor.authorJONG-KEUK, PARK-
dc.contributor.authorLeeJungHoon-
dc.contributor.authorLee, Wook Seong-
dc.contributor.authorBaik, Young Joon-
dc.date.accessioned2024-01-12T18:35:56Z-
dc.date.available2024-01-12T18:35:56Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/93976-
dc.languageEnglish-
dc.titleEffect of Substrate Bias and Hydrogen Addition on the Residual Stress of Hexagonal Boron Nitride Film Prepared by Sputtering of B4C Target with Ar/N2 Reactive Gas-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationICMCTF2013-
dc.citation.titleICMCTF2013-
dc.citation.conferencePlaceUS-
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE