Establishment of optimal {100} Si etching condition for N2H4-H2O solutions and application to electrochemical etching

Title
Establishment of optimal {100} Si etching condition for N2H4-H2O solutions and application to electrochemical etching
Authors
주병권이윤희김형곤오명환
Issue Date
1989-11
Publisher
전자공학회 논문지
Citation
VOL 26, NO 11, 56-60
URI
http://pubs.kist.re.kr/handle/201004/9770
Appears in Collections:
KIST Publication > Article
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