Lee Joong Kee JEON BUP JU 고형덕 Byun Dongjin Park Dal keun 2024-01-13T12:30:32Z 2024-01-13T12:30:32Z 2021-09-29 https://pubs.kist.re.kr/handle/201004/106723 English ECR-MOCVD Influence of the process parameters on the surface resistance of Cu/C films on polymer substrates prepared at ambient temperature by ECR-chemical vapor deposition. Conference 1 17th International Symposium on Chemical Reaction Engineering, pp.MS# 0150 17th International Symposium on Chemical Reaction Engineering MS# 0150 MS# 0150 HK