PARK YOUNG JOON Vaibhav K. Andleigh Carl V. Thompson 최인석 주영창 2024-01-13T15:04:10Z 2024-01-13T15:04:10Z 2021-09-29 https://pubs.kist.re.kr/handle/201004/108259 English electromigration computer simulation ULSI interconnect failures due to electromigration-induced stress evolution: computer simulation study Conference 1 Proc. of the 6th Workshop on Atomic-migration and Stress-induced Phenomena in ULSI Metallizations, pp.19 - 22 Proc. of the 6th Workshop on Atomic-migration and Stress-induced Phenomena in ULSI Metallizations 19 22 JA