KANG JONG HEE 신중한 이재형 Kim Jun Woo KIM JONG MAN Han Dong Keun Ahn Kwang-Duk 박재근 문성윤 문봉석 2024-01-13T19:04:37Z 2024-01-13T19:04:37Z 2021-09-29 https://pubs.kist.re.kr/handle/201004/110442 English Alicyclic polymers based on t-BOC protected norbornene derivatives for applications as ArF photoresists Conference 2 한국고분자학회 , 구미 금오공대 , 1998. 10. 16-17., pp.249 한국고분자학회 , 구미 금오공대 , 1998. 10. 16-17. 249 249 KO