Ho Nyung Lee Kim Yong Tae 이창우 임명호 T. S. Kalkur 2024-01-13T19:33:21Z 2024-01-13T19:33:21Z 2021-09-29 https://pubs.kist.re.kr/handle/201004/110644 English MEFISFET Fabrication of metal-ferroelectric-insulator-semiconductor field effect transistor (MEFISFET) using Pt-SrBi//2Ta//2O//9-Y//2O//3-Si structure Conference 1 Proc. of solid state devices and materials, pp.382 - 383 Proc. of solid state devices and materials 382 383 JA