JEON BUP JU 허정수 윤용수 정일현 Oh In Hwan Lim Tae Hoon 2024-01-13T21:32:42Z 2024-01-13T21:32:42Z 2021-09-29 https://pubs.kist.re.kr/handle/201004/111664 English Characteristics of silicon oxide films prepared by chemical vapor deposition and dry oxidation method using ECR plasma sources. ECR 플라즈마를 이용한 화학증착법 및 건식 산화법에 의해 제조된 실리콘 산화막의 특성 Conference 2 Theories and applications of chem. res., v.2, no.1, pp.933 - ? Theories and applications of chem. res. 2 1 933 ? KO