D.Y.C. Lie SONG JONG HAN M.-A. Nicolet M.O. Tanner S. Thomas K.L. Wang 2024-01-13T22:02:56Z 2024-01-13T22:02:56Z 2021-09-29 https://pubs.kist.re.kr/handle/201004/111934 English Solid-phase epitaxial regrowth and dopant activation of arsenic-implanted metastable pseudomorphic Ge0.08Si0.92 and Ge0.16Si0.84 on Si(100) Conference 1 Material Research Society Symposium Proceedings, v.379, pp.467 - 472 Material Research Society Symposium Proceedings 379 467 472 US