Thakur, Anup Kumar, Varinder Kang, Se Jun Lee, Ik-Jae Gautam, Sanjeev Chae, K. H. Shin, Hyun Joon 2024-01-19T12:08:47Z 2024-01-19T12:08:47Z 2022-03-07 2014 0094-243X https://pubs.kist.re.kr/handle/201004/115395 Nitrogen doped SnO2thin films (thickness similar to 250 nm) were deposited at different substrate temperature by radio frequency (rf) sputtering method. Crystal structure, morphology and optical properties of these films were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and UV-VIS-NIR spectrophotometer, respectively. XRD measurement suggests that the film deposited at room temperature was amorphous in nature and films deposited at higher temperature were crystalline in nature. The film deposited at RT and 200 degrees C have transparency more than 90% in visible region but the film deposited at 400 degrees C has lesser transparency. Red shift was observed in the absorption edge may be due to decrease in ionicity due tothe formation of the Sn-N bond. English AMER INST PHYSICS Effect of Substrate Temperature on Structural and Optical Properties of Nitrogen Doped SnO2 Thin Film Conference 10.1063/1.4872841 1 58th DAE Solid State Physics Symposium, v.1591, pp.1027 - 1029 58th DAE Solid State Physics Symposium 1591 1027 1029 US Thapar Univ, Patiala, INDIA 2013-12-17 SOLID STATE PHYSICS: PROCEEDINGS OF THE 58TH DAE SOLID STATE PHYSICS SYMPOSIUM 2013, PTS A & B 000341870600369 2-s2.0-84903128757 Proceedings Paper