Lee, Jong-Han Shin, Sangwon Kwon, Youngsuk Choi, In-Hoon Whang, Chungnam Kim, Taegon Song, Jonghan 2024-01-19T13:38:19Z 2024-01-19T13:38:19Z 2022-03-07 2007 1012-0394 https://pubs.kist.re.kr/handle/201004/116390 Ni(60 angstrom)/Cu film possessing perpendicular magnetic anisotropy (PMA) changes its easy direction into the plane by ion irradiation, due to the relaxation of the strain. By fixing our eyes upon this magnetic property, the magnetic patterning of Ni(60 angstrom)/Cu film using 40 keV 0 ion irradiation was performed through the photo-resist (PR) mask having 10 mu m x 10 mu m pattern sizes to pattern the magnetic film. After the PR mask removal of an irradiated film, the magnetic properties were investigated by the rnagneto-optic Kerr effect and the formation of magnetic pattern was observed by the magnetic force microscopy. The PMA magnetic patterning of epitaxial Ni/Cu film was successfully performed in scale of mu m by using ion irradiation, compatible with device process. English TRANS TECH PUBLICATIONS LTD Magnetic patterning of the Ni/Cu thin film by 40 keV O ion irradiation Conference 10.4028/www.scientific.net/SSP.124-126.867 1 IUMRS International Conference in Asia, v.124-126, pp.867 - + IUMRS International Conference in Asia 124-126 867 + SZ Cheju Isl, SOUTH KOREA 2006-09-10 ADVANCES IN NANOMATERIALS AND PROCESSING, PTS 1 AND 2 000245890100216 2-s2.0-38549124548 Proceedings Paper