Kim, Tae Kyoung Bae, Jee Hwan Kim, Juyoung Kim, Yu-Chan Jin, Sungho Chun, Dong Won 2024-01-19T18:32:09Z 2024-01-19T18:32:09Z 2021-09-04 2020-01 2637-6113 https://pubs.kist.re.kr/handle/201004/119174 Herein, the bulk micromachining of Si by a magnetically guided metal-assisted chemical etching (MACE) process is demonstrated. To improve the etching performance of Si, a trilayer metal catalyst (Au/Fe/Au) is deposited on Si to obtain faster etching speed by a magnetic pulling force. An annealing process is performed on the catalyst to obtain rougher surface morphologies due to agglomeration and improve ferromagnetic properties, which increase the etching rate for magnetically guided MACE. By the bulk micromachining of Si through the introduced direction-controlled MACE technique with the annealing process, Si microsheet arrays are fabricated. We show that vertically aligned Si microsheet arrays are produced within 17 h of etching, even at an etching thickness of over 500 pm, by magnetically guided MACE under a fixed vertical magnetic pulling force. Moreover, introducing magnetically guided MACE can fabricate Si microhole arrays in various dimensions by adjusting pattern size and etching time. Curved Si microhole arrays are fabricated by altering the direction of the magnetic pulling force by changing the position of the hard magnet, which shows that the etching direction is effectively adjusted during the bulk micromachining of Si. The etching method developed here can be applied to cost-effective bulk Si slicing processes. English AMER CHEMICAL SOC Bulk Micromachining of Si by Annealing-Driven Magnetically Guided Metal-Assisted Chemical Etching Article 10.1021/acsaelm.9b00746 1 ACS APPLIED ELECTRONIC MATERIALS, v.2, no.1, pp.260 - 267 ACS APPLIED ELECTRONIC MATERIALS 2 1 260 267 N scie scopus 000510530100033 2-s2.0-85087724724 Engineering, Electrical & Electronic Materials Science, Multidisciplinary Engineering Materials Science Article SILICON NANOWIRE ARRAYS PERFORMANCE TMAH KOH bulk micromachining Si etching magnetically guided metal-assisted chemical etching annealing effect curved Si structure