Park, Yoonkyung Park, Jinseon Cho, Sangho Sung, Myung Mo 2024-01-19T18:34:36Z 2024-01-19T18:34:36Z 2021-09-05 2019-11-15 0169-4332 https://pubs.kist.re.kr/handle/201004/119322 We report a one-step fabrication method for large-area single-crystal organic thin films guided through vertically confined lateral crystal growth via capillary force lithography (VC-LCG via CLF). In this method, organic molecules in ink solutions self-assemble and crystallize within the vertically confined channels of patterned molds. Vertical confinement, determined by the channel depth, played a major role with regard to the crystallization and formation of single-crystalline organic thin films. We also demonstrated its usefulness by fabricating wafer-scale arrays of single-crystal organic thin film transistors with high performance and uniformly distributed electrical properties, which could be attributed to their large-scale single-crystalline nature, homogeneous film morphologies and the suppression of multiple crystal orientations. Especially, the versatility to various organic molecules, ease of processing optimization, and uniform crystallinity all over the patterned area increase the possibility of VC-LCG to apply in the industrial process. English ELSEVIER FIELD-EFFECT TRANSISTORS ELECTRON CRYSTALLOGRAPHY CHARGE-TRANSPORT SEMICONDUCTORS PERFORMANCE DEPOSITION DESIGN Large-area single-crystal organic patterned thin films by vertically confined lateral crystal growth via capillary force lithography Article 10.1016/j.apsusc.2019.07.184 1 APPLIED SURFACE SCIENCE, v.494, pp.1023 - 1029 APPLIED SURFACE SCIENCE 494 1023 1029 scie scopus 000487838900115 2-s2.0-85073648543 Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Chemistry Materials Science Physics Article FIELD-EFFECT TRANSISTORS ELECTRON CRYSTALLOGRAPHY CHARGE-TRANSPORT SEMICONDUCTORS PERFORMANCE DEPOSITION DESIGN Single crystal organic thin film Large-area fabrication Vertical confinement High mobility Organic field-effect transistor Capillary force lithography