<?xml version="1.0" encoding="utf-8" standalone="no"?>
<dublin_core schema="dc">
<dcvalue element="contributor" qualifier="author">Park,&#x20;Yongkook</dcvalue>
<dcvalue element="contributor" qualifier="author">Ahn,&#x20;Hyoseong</dcvalue>
<dcvalue element="contributor" qualifier="author">Lee,&#x20;Kyu-Tae</dcvalue>
<dcvalue element="contributor" qualifier="author">Kim,&#x20;Ji-hyun</dcvalue>
<dcvalue element="contributor" qualifier="author">Nam,&#x20;Minwoo</dcvalue>
<dcvalue element="contributor" qualifier="author">Cho,&#x20;Junhee</dcvalue>
<dcvalue element="contributor" qualifier="author">Han,&#x20;Joon&#x20;Soo</dcvalue>
<dcvalue element="contributor" qualifier="author">Kim,&#x20;Sun-Kyung</dcvalue>
<dcvalue element="contributor" qualifier="author">Ko,&#x20;Doo-Hyun</dcvalue>
<dcvalue element="date" qualifier="accessioned">2024-01-19T19:02:37Z</dcvalue>
<dcvalue element="date" qualifier="available">2024-01-19T19:02:37Z</dcvalue>
<dcvalue element="date" qualifier="created">2021-09-04</dcvalue>
<dcvalue element="date" qualifier="issued">2019-10-04</dcvalue>
<dcvalue element="identifier" qualifier="issn">0957-4484</dcvalue>
<dcvalue element="identifier" qualifier="uri">https:&#x2F;&#x2F;pubs.kist.re.kr&#x2F;handle&#x2F;201004&#x2F;119469</dcvalue>
<dcvalue element="description" qualifier="abstract">Silicon&#x20;photonic&#x20;structures&#x20;have&#x20;attracted&#x20;a&#x20;great&#x20;deal&#x20;of&#x20;attention&#x20;due&#x20;to&#x20;their&#x20;potential&#x20;benefits&#x20;of&#x20;efficient&#x20;light&#x20;management&#x20;in&#x20;optoelectronic&#x20;applications.&#x20;In&#x20;this&#x20;paper,&#x20;we&#x20;demonstrate&#x20;broadband&#x20;optical&#x20;absorption&#x20;enhancement&#x20;in&#x20;solution-processed&#x20;amorphous&#x20;silicon&#x20;(a-Si)&#x20;by&#x20;leveraging&#x20;the&#x20;advantages&#x20;of&#x20;silicon&#x20;photonic&#x20;structures.&#x20;Graded&#x20;refractive&#x20;index&#x20;silicon&#x20;multilayer&#x20;structures&#x20;are&#x20;employed&#x20;by&#x20;modulating&#x20;optical&#x20;constants&#x20;with&#x20;simple&#x20;process&#x20;optimization,&#x20;resulting&#x20;in&#x20;significantly&#x20;improved&#x20;reflectance&#x20;over&#x20;a&#x20;broad&#x20;range&#x20;of&#x20;visible&#x20;wavelengths.&#x20;In&#x20;addition,&#x20;nanopatterning&#x20;flexibility&#x20;of&#x20;solution-processed&#x20;silicon&#x20;provides&#x20;benefits&#x20;for&#x20;tailoring&#x20;silicon&#x20;optical&#x20;properties.&#x20;With&#x20;the&#x20;incorporation&#x20;of&#x20;the&#x20;two-dimensional&#x20;submicron&#x20;pattern&#x20;into&#x20;silicon&#x20;films,&#x20;the&#x20;absorptivity&#x20;of&#x20;silicon&#x20;films&#x20;improves&#x20;considerably&#x20;below&#x20;the&#x20;wavelength&#x20;of&#x20;the&#x20;bandgap&#x20;(lambda&#x20;similar&#x20;to&#x20;800&#x20;nm),&#x20;and&#x20;the&#x20;limited&#x20;bandwidth&#x20;of&#x20;absorptivity&#x20;in&#x20;silicon&#x20;films&#x20;can&#x20;be&#x20;extended&#x20;to&#x20;near-infrared&#x20;wavelengths&#x20;by&#x20;coating&#x20;with&#x20;a&#x20;thin&#x20;gold&#x20;layer.&#x20;The&#x20;methodology&#x20;is&#x20;generally&#x20;applicable&#x20;to&#x20;a&#x20;platform&#x20;for&#x20;improving&#x20;the&#x20;broadband&#x20;optical&#x20;absorption&#x20;of&#x20;photonic&#x20;and&#x20;optoelectronic&#x20;devices.</dcvalue>
<dcvalue element="language" qualifier="none">English</dcvalue>
<dcvalue element="publisher" qualifier="none">IOP&#x20;PUBLISHING&#x20;LTD</dcvalue>
<dcvalue element="subject" qualifier="none">NANOIMPRINT&#x20;LITHOGRAPHY</dcvalue>
<dcvalue element="subject" qualifier="none">LOW-TEMPERATURE</dcvalue>
<dcvalue element="subject" qualifier="none">SILICON</dcvalue>
<dcvalue element="title" qualifier="none">All-solution-processed&#x20;Si&#x20;films&#x20;with&#x20;broadband&#x20;and&#x20;omnidirectional&#x20;light&#x20;absorption</dcvalue>
<dcvalue element="type" qualifier="none">Article</dcvalue>
<dcvalue element="identifier" qualifier="doi">10.1088&#x2F;1361-6528&#x2F;ab2d05</dcvalue>
<dcvalue element="description" qualifier="journalClass">1</dcvalue>
<dcvalue element="identifier" qualifier="bibliographicCitation">NANOTECHNOLOGY,&#x20;v.30,&#x20;no.40</dcvalue>
<dcvalue element="citation" qualifier="title">NANOTECHNOLOGY</dcvalue>
<dcvalue element="citation" qualifier="volume">30</dcvalue>
<dcvalue element="citation" qualifier="number">40</dcvalue>
<dcvalue element="description" qualifier="journalRegisteredClass">scie</dcvalue>
<dcvalue element="description" qualifier="journalRegisteredClass">scopus</dcvalue>
<dcvalue element="identifier" qualifier="wosid">000476531600002</dcvalue>
<dcvalue element="identifier" qualifier="scopusid">2-s2.0-85071689926</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Nanoscience&#x20;&amp;&#x20;Nanotechnology</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Materials&#x20;Science,&#x20;Multidisciplinary</dcvalue>
<dcvalue element="relation" qualifier="journalWebOfScienceCategory">Physics,&#x20;Applied</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Science&#x20;&amp;&#x20;Technology&#x20;-&#x20;Other&#x20;Topics</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Materials&#x20;Science</dcvalue>
<dcvalue element="relation" qualifier="journalResearchArea">Physics</dcvalue>
<dcvalue element="type" qualifier="docType">Article</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">NANOIMPRINT&#x20;LITHOGRAPHY</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">LOW-TEMPERATURE</dcvalue>
<dcvalue element="subject" qualifier="keywordPlus">SILICON</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">solution&#x20;processing</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">amorphous&#x20;silicon</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">graded&#x20;refractive&#x20;index&#x20;antireflection&#x20;layers</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">nanoimprint&#x20;lithography</dcvalue>
<dcvalue element="subject" qualifier="keywordAuthor">nanopatterned&#x20;photonic&#x20;structures</dcvalue>
</dublin_core>
