Chung, Jiyong Lee, Jeong Hee Kim, Kyeounghak Lee, Jaeyoung Yoo, Sung Jong Han, Jeong Woo Kim, Jinsoo Yu, Taekyung 2024-01-19T19:33:23Z 2024-01-19T19:33:23Z 2021-09-02 2019-07-07 2040-3364 https://pubs.kist.re.kr/handle/201004/119780 The etching process can be a useful method for the morphology control of nanostructures. Using precise experiments and theoretical calculations, we report a new ZnO etching process triggered by the reaction of ZnO with transition metal cations and demonstrate that the etching rate and direction could be controlled by varying the kind of transition metal cation. In addition, the developed etching process was introduced to form a thin and uniform ZnO layer, which was utilized for the fabrication of an improved propylene-selective ZIF-8 membrane via conversion seeding and secondary growth. English ROYAL SOC CHEMISTRY MIXED MATRIX MEMBRANES ZIF-8 MEMBRANES ZNO NANOPARTICLES NANOSTRUCTURES SEPARATION CONVERSION NANOSHEETS NANORODS GROWTH A new etching process for zinc oxide with etching rate and crystal plane control: experiment, calculation, and membrane application Article 10.1039/c9nr02248a 1 NANOSCALE, v.11, no.25, pp.12337 - 12346 NANOSCALE 11 25 12337 12346 scie scopus 000475468100029 2-s2.0-85068203609 Chemistry, Multidisciplinary Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Chemistry Science & Technology - Other Topics Materials Science Physics Article MIXED MATRIX MEMBRANES ZIF-8 MEMBRANES ZNO NANOPARTICLES NANOSTRUCTURES SEPARATION CONVERSION NANOSHEETS NANORODS GROWTH