Shin, Seung-Wook Kim, Jong Seon Kim, Seon Joon Kim, Dae Woo Jung, Hee-Tae 2024-01-19T19:34:01Z 2024-01-19T19:34:01Z 2021-09-02 2019-07 1226-086X https://pubs.kist.re.kr/handle/201004/119817 We demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly (hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122%), hardness (92%), and etch resistance (54%) were significantly enhanced at 17 wt.% graphene loading, surpassing the properties of commercial CHM009 film. (C) 2019 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved. English 한국공업화학회 Polybenzoxazole/graphene nanocomposite for etching hardmask Article 10.1016/j.jiec.2019.03.042 1 Journal of Industrial and Engineering Chemistry, v.75, pp.296 - 303 Journal of Industrial and Engineering Chemistry 75 296 303 N scie scopus kci ART002492959 000466248600034 2-s2.0-85063686080 Chemistry, Multidisciplinary Engineering, Chemical Chemistry Engineering Article GRAPHENE OXIDE CARBON NANOTUBES MEMBRANES RESISTANCE BEHAVIOR WATER Hardmask Composite Grapheme oxide Patterning Etch resistance