Oh, Jinwoo Suh, Hyo Seon Ko, Youngpyo Nah, Yoonseo Lee, Jong-Chan Yeom, Bongjun Char, Kookheon Ross, Caroline A. Son, Jeong Gon 2024-01-19T19:34:21Z 2024-01-19T19:34:21Z 2021-09-02 2019-07 2041-1723 https://pubs.kist.re.kr/handle/201004/119835 Sub-10 nm patterns prepared by directed self-assembly (DSA) of block copolymer (BCP) thin films offer a breakthrough method to overcome the limitations of photolithography. Perpendicular orientation of the BCP nanostructures is essential for lithographic applications, but dissimilar surface/interfacial energies of two blocks generally favour parallel orientations, so that the perpendicular orientation could only be obtained under very limited conditions. Here, we introduce a generalized method for creating perpendicular orientations by filtered plasma treatment of the BCP films. By cross-linking the surface of disordered BCP films using only physical collisions of neutral species without ion bombardment or UV irradiation, neutral layers consistent with the BCP volume fraction are produced that promote the perpendicular orientations. This method works with BCPs of various types, volume fractions, and molecular weights individually at the top and bottom interfaces, so it was applied to orientation-controlled 3D multilayer structures and DSA processes for sub-10 nm line-spacing patterns. English Nature Publishing Group Universal perpendicular orientation of block copolymer microdomains using a filtered plasma Article 10.1038/s41467-019-10907-5 1 Nature Communications, v.10 Nature Communications 10 Y scie scopus 000473425300009 2-s2.0-85068382917 Multidisciplinary Sciences Science & Technology - Other Topics Article THIN-FILMS GRAPHOEPITAXY LITHOGRAPHY ARRAYS ION 블록공중합체 10나노 이하 패터닝 유도자기조립 DSA 나노구조 배향 수직 배향