Jang, Seong Woo Hwang, Sehoon Lim, Sang Ho Han, Seunghee 2024-01-19T20:03:55Z 2024-01-19T20:03:55Z 2021-09-02 2019-05 0042-207X https://pubs.kist.re.kr/handle/201004/120060 In this study, we report a new method for fabricating nanoporous thin films. In the first step, metal-carbon thin films were prepared by radio-frequency reactive magnetron sputtering, using Cu, Ni, and Ti targets as the metal sources and CH4 gas as the carbon source during the co-deposition process. In the second step, the metal-carbon films were then oxidized by an oxygen plasma generated with a flowing a gas mixture of Ar and O-2, and nanoporous metal-oxide films were obtained by removing carbon atoms from the metal-carbon thin films. The pores in the films varied with the amount of carbon in the film surface, and mesopores grew to lager macropores as the flow rate of CH4 was increased. Depending on the film composition, the calculated porosity varied from 50% to 90%. With advantages such as a wide range of suitable raw materials and good reproducibility, this fabrication method is expected to offer a new approach to the commercial production of nanoporous materials. English PERGAMON-ELSEVIER SCIENCE LTD COPPER DEPOSITION NICKEL Fabrication of nanoporous thin films via radio-frequency magnetron sputtering and O-2 plasma ashing Article 10.1016/j.vacuum.2019.01.049 1 VACUUM, v.163, pp.81 - 87 VACUUM 163 81 87 scie scopus 000462690400012 2-s2.0-85061382853 Materials Science, Multidisciplinary Physics, Applied Materials Science Physics Article COPPER DEPOSITION NICKEL Nanoporous thin films Radio-frequency magnetron sputtering Oxygen plasma ashing Porosity