Kim, Hyuk Jin Maeng, Min-Jae Park, J. H. Kang, Min Gyu Kang, Chong Yun Park, Yongsup Chang, Young Jun 2024-01-19T21:01:12Z 2024-01-19T21:01:12Z 2021-09-02 2019-02 1567-1739 https://pubs.kist.re.kr/handle/201004/120413 We investigated the influence of excimer-laser annealing (ELA) on the electrical, chemical, and structural properties of indium-fin oxide (ITO) films prepared by a solution process. The ITO film was prepared by the solgel method and annealed by excimer-laser pulses with an energy density up to 240 mJ/cm(2). Hall measurements showed that the ELA substantially enhanced the electrical properties of the ITO films, including their resistivity, carrier density, and mobility, as increasing the laser energy density. In-depth x-ray photoelectron spectroscopy analysis of the chemical states in the film surface showed that the ELA reduced carbon species and promoted both an oxidation and crystallization. These changes were consistent with results of x-ray diffraction and transmission electron microscopy measurements, where expansions in the microcrystal growth were observed for higher laser energy density. We comprehensively understand that the chemical rearrangement and concomitant crystallization are the main factors for achieving the electrical properties during the ELA. These results suggest the potential of the ELA-treated sol-gel films for providing high-quality ITO films M low temperatures toward the flexible device applications. English ELSEVIER THIN-FILMS TRANSPARENT CRYSTALLIZATION ELECTRODE FABRICATION GRAPHENE GROWTH Chemical and structural analysis of low-temperature excimer-laser annealing in indium-tin oxide sol-gel films Article 10.1016/j.cap.2018.12.005 1 CURRENT APPLIED PHYSICS, v.19, no.2, pp.168 - 173 CURRENT APPLIED PHYSICS 19 2 168 173 scie scopus kci ART002437771 000456023200016 2-s2.0-85058407697 Materials Science, Multidisciplinary Physics, Applied Materials Science Physics Article THIN-FILMS TRANSPARENT CRYSTALLIZATION ELECTRODE FABRICATION GRAPHENE GROWTH Indium-tin oxide (ITO) Excimer-laser annealing (ELA) X-ray photoemission spectroscopy (XPS) Transmission electron microscopy (TEM)