Hudaya, Chairul Ahn, Minjeh Oh, Si Hyoung Jeon, Bup Ju Sung, Yung-Eun Lee, Joong Kee 2024-01-19T22:03:42Z 2024-01-19T22:03:42Z 2021-09-03 2018-08 1226-086X https://pubs.kist.re.kr/handle/201004/121085 Despite the advantage of chemical vapor deposition (CVD) for realization of large area epitaxial growth of graphene on transition metal catalysts, both etching and transfer process of CVD-grown graphene sheets still remain a big challenge. Here we demonstrate the formation of multilayer graphene (MLG) sheets tailored from C-60 thin films on the top of Si/Ni substrate without etching and transfer steps based on Ni films. This self-assembled process separates the MLG sheets from the conductive Ni catalyst, embarking a possibility for direct characterizations of MLG sheets. The fine-tuned C-60 films (30 nm) are transformed into approximately 17 MLG sheets, thus making it large-area MLG sheets for a variety of direct applications. (C) 2018 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved. English 한국공업화학회 Simultaneous etching and transfer - Free multilayer graphene sheets derived from C-60 thin films Article 10.1016/j.jiec.2018.01.037 1 Journal of Industrial and Engineering Chemistry, v.64, pp.70 - 75 Journal of Industrial and Engineering Chemistry 64 70 75 N scie scopus kci ART002377677 000437068500004 2-s2.0-85042385524 Chemistry, Multidisciplinary Engineering, Chemical Chemistry Engineering Article EPITAXIAL GRAPHENE MOLECULES GRAPHITE Graphene C-60 Thin film Multilayer Thermal evaporation