Kim, J-H Yoon, S. M. Jo, Sujin Seo, J. Kim, J-S 2024-01-19T22:30:18Z 2024-01-19T22:30:18Z 2021-09-03 2018-07-11 0953-8984 https://pubs.kist.re.kr/handle/201004/121159 Nanopatterning at solid surfaces by ion beam sputtering (IBS) has been practiced mostly for stationary substrates with an ion beam incident under a fixed sputter geometry. We have released such constraints in the sputter condition. We simultaneously apply two ion beams or sequentially vary the orientation of substrate with respect to an ion beam. We also periodically change either the azimuthal or polar angle of the substrate with respect to an ion beam during IBS. These unconventional ways of IBS can improve the order of the pattern, and produce novel and non trivial nano patterns that well serve as touch stones to refine the theoretical models and thus deepen our understanding of the patterning mechanisms by IBS. English IOP PUBLISHING LTD PATTERN-FORMATION SURFACE NANOSTRUCTURES MECHANISM EVOLUTION Nanopatterning by ion beam sputtering in unconventional formats Article 10.1088/1361-648X/aac7d7 1 JOURNAL OF PHYSICS-CONDENSED MATTER, v.30, no.27 JOURNAL OF PHYSICS-CONDENSED MATTER 30 27 scie scopus 000435376100001 2-s2.0-85049017597 Physics, Condensed Matter Physics Article PATTERN-FORMATION SURFACE NANOSTRUCTURES MECHANISM EVOLUTION nanopatterning ion beam sputtering sequential ion beam sputtering swing during ion beam sputtering dual ion beam sputtering rocking during ion beam sputtering