Kang, JoonHyun Lee, Song-Ee Park, Joon-Suh Kim, Young-Hwan Han, Il Ki 2024-01-20T00:34:27Z 2024-01-20T00:34:27Z 2021-09-04 2017-09 0021-4922 https://pubs.kist.re.kr/handle/201004/122375 The surface of poly(methyl methacrylate) (PMMA) film was etched by laser irradiation under O-2 and vacuum conditions. By activating the O-2 molecules near the rough surface, oxygen radicals will preferably etch the protrusions on the PMMA surface. Three lasers of different wavelengths were used for comparison. Laser irradiation at a short wavelength such as 325 nm resulted in high etch rates whereas a long wavelength such as 532 nm resulted in no effect on the surface profile. The PMMA surface was not etched under the vacuum condition, indicating the necessity of O-2 molecules in etching. (C) 2017 The Japan Society of Applied Physics English IOP PUBLISHING LTD 2ND-HARMONIC GENERATION FIELD ENHANCEMENT IMPROVEMENT Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching Article 10.7567/JJAP.56.090306 1 JAPANESE JOURNAL OF APPLIED PHYSICS, v.56, no.9 JAPANESE JOURNAL OF APPLIED PHYSICS 56 9 scie scopus 000408004300001 2-s2.0-85031291033 Physics, Applied Physics Article 2ND-HARMONIC GENERATION FIELD ENHANCEMENT IMPROVEMENT surface smoothing photochemical etching PMMA dressed photon