Lee, Geun-Hyuk An, Sehoon Jang, Seong Woo Hwang, Sehoon Lim, Sang Ho Han, Seunghee 2024-01-20T01:30:39Z 2024-01-20T01:30:39Z 2021-09-01 2017-06-01 0040-6090 https://pubs.kist.re.kr/handle/201004/122658 In this study, 300 nm thick nanoporous (np) noble metal thin films containing mesopores (2-50 nm) or macropores (N50 nm) were fabricated by O-2 plasma dealloying of sputter-deposited noble metal-carbon thin films. Noble metal-carbon thin films of 500 nm thickness were deposited on Si wafer substrates, and the target power was controlled to obtain a proper compositional ratio. Subsequently, O2 plasma dealloying was performed to selectively remove carbon atoms, thereby forming the np structure. Using this method, we successfully fabricated various np thin films of noble metals, such as Au, Ag and Pt. (C) 2017 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE SA GOLD AU EVOLUTION SILVER Fabrication of nanoporous noble metal thin films by O-2 plasma dealloying Article 10.1016/j.tsf.2017.04.025 1 THIN SOLID FILMS, v.631, pp.147 - 151 THIN SOLID FILMS 631 147 151 scie scopus 000401082400021 2-s2.0-85017584154 Materials Science, Multidisciplinary Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter Materials Science Physics Article GOLD AU EVOLUTION SILVER Porous material Thin films Sputtering Dealloying Surface diffusion Oxygen plasma