Ko, Young-Jin Cho, Jung-Min Kim, Inho Jeong, Doo Seok Lee, Kyeong-Seok Park, Jong-Keuk Baik, Young-Joon Choi, Heon-Jin Lee, Wook-Seong 2024-01-20T02:00:19Z 2024-01-20T02:00:19Z 2021-09-01 2017-04 0926-3373 https://pubs.kist.re.kr/handle/201004/122884 We report a new approach to the durability issue in tungsten carbide electrocatalyst for hydrogen evolution reaction (HER), in a form radically differing from that of the conventional nanoparticle approach: the WC nanowalls, bottom-up grown by a plasma-assisted deposition on Si wafer. The pristine nanowall was highly crystalline and its surface was smooth in atomic scale, which enabled a superior durability in HER environment: no oxidation occurred at prolonged cycling (10,000 cycles) in the HER environment, even without additional functionalization or modification. The electrochemical activity, as presented by Tafel slope and turnover frequency (TOF), was as excellent as those of the best data in the literature. (C) 2016 Elsevier B.V. All rights reserved. English Elsevier BV Tungsten carbide nanowalls as electrocatalyst for hydrogen evolution reaction: New approach to durability issue Article 10.1016/j.apcatb.2016.10.085 1 Applied Catalysis B: Environmental, v.203, pp.684 - 691 Applied Catalysis B: Environmental 203 684 691 N scie scopus 000390965000068 2-s2.0-85006100862 Chemistry, Physical Engineering, Environmental Engineering, Chemical Chemistry Engineering Article THIN-FILM CARBON WATER NANOPARTICLES DEPOSITION CATALYSIS ENERGY Hydrogen evolution Tungsten carbide Nanowall structure Electrochemical durability Turnover frequency