LEPORTIER, THIBAULT LOUIS DAVID Park, Min-Chul Kim, Wooshik Song, Jin Dong 2024-01-20T03:04:13Z 2024-01-20T03:04:13Z 2022-01-25 2016-10 0091-3286 https://pubs.kist.re.kr/handle/201004/123586 We present a method to characterize not only shape but also depth of defects in line and space mask patterns. Features in a mask are too fine for a conventional imaging system to resolve them and a coherent imaging system providing only the pattern diffracted by the mask is used. Then phase retrieval methods may be applied, but the accuracy is too low to determine the exact shape of the defect. Deterministic methods have been proposed to accurately characterize the defect, but this requires a reference pattern. We propose to use a phase retrieval algorithm to retrieve the general shape of the mask and then apply a deterministic approach to precisely characterize the defects detected. (C) The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. English SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS Accurate characterization of mask defects by combination of phase retrieval and deterministic approach Article 10.1117/1.OE.55.10.103105 1 OPTICAL ENGINEERING, v.55, no.10 OPTICAL ENGINEERING 55 10 N scie scopus 000388233400011 2-s2.0-84992160270 Optics Optics Article ALGORITHMS MICROSCOPE phase retrieval deterministic approach mask inspection extreme ultraviolet lithography