Seo, Tae Hoon Lee, Seula Cho, Hyunjin Chandramohan, S. Suh, Eun-Kyung Lee, Heon Sang Bae, Su Kang Kim, Soo Min Park, Min Lee, Jae Kwan Kim, Myung Jong 2024-01-20T04:31:41Z 2024-01-20T04:31:41Z 2021-09-04 2016-04-11 2045-2322 https://pubs.kist.re.kr/handle/201004/124173 The chemical vapor deposition (CVD) method to obtain tailored graphene as a transparent and flexible gas barrier has been developed. By separating nucleation step from growth, we could reduce early graphene nucleation density and thus induce better stitching between domain boundaries in the second growth step. Furthermore, two step growth in conjunction with electrochemical polishing of Cu foils achieved large graphene domains and improved graphene quality with minimized defects. The performance of resulting graphene as a gas barrier was superior to the graphene obtained by one-step growth on polished or unpolished Cu foils. The CVD graphene reported here could open up the possibility for exploring graphene-based gas barrier due to the minimized density of defect area. English NATURE PUBLISHING GROUP CHEMICAL-VAPOR-DEPOSITION FILMS GROWTH CU COPPER FOILS Tailored CVD graphene coating as a transparent and flexible gas barrier Article 10.1038/srep24143 1 SCIENTIFIC REPORTS, v.6 SCIENTIFIC REPORTS 6 scie scopus 000373762800001 2-s2.0-84963800072 Multidisciplinary Sciences Science & Technology - Other Topics Article CHEMICAL-VAPOR-DEPOSITION FILMS GROWTH CU COPPER FOILS CVD graphene gas barrier