Seo, A.-N. Choi, J.-H. Pyun, J.-C. Kim, W.M. Kim, I. Lee, K.-S. 2024-01-20T05:32:59Z 2024-01-20T05:32:59Z 2021-09-02 2015-12 1225-0562 https://pubs.kist.re.kr/handle/201004/124730 Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a highthroughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography. ？ Materials Research Society of Korea. Korean Korea Federation of Science and Technology Microspheres Monolayers Organic polymers Photoresists Polystyrenes Self assembly Throughput Convective self-assembly High throughput Langmuir-blodgett Lithographic mask Photonic nanojet Photoresist layers Polystyrene beads Processing parameters Self assembled monolayers Effect of processing parameters on the formation of large area self-assembled monolayer of polystyrene beads by a convective self-assembly method Article 10.3740/MRSK.2015.25.12.647 1 Korean Journal of Materials Research, v.25, no.12, pp.647 - 654 Korean Journal of Materials Research 25 12 647 654 scopus kci ART002058850 2-s2.0-84957952991 Article Microspheres Monolayers Organic polymers Photoresists Polystyrenes Self assembly Throughput Convective self-assembly High throughput Langmuir-blodgett Lithographic mask Photonic nanojet Photoresist layers Polystyrene beads Processing parameters Self assembled monolayers Convective self-assembly method High-throughput process Large area monolayer Polystyrene bead