Pyeon, Jung Joon Cho, Cheol Jin Baek, Seung-Hyub Kang, Chong-Yun Kim, Jin-Sang Jeong, Doo Seok Kim, Seong Keun 2024-01-20T06:33:01Z 2024-01-20T06:33:01Z 2021-09-04 2015-07-31 0957-4484 https://pubs.kist.re.kr/handle/201004/125213 The controllability of the nucleation behavior of Pt in atomic layer deposition (ALD) by surface pretreatments with H2O, H2S, and NH3 was investigated. The H2O pretreatment on SiO2 and TiO2 surfaces had little effect on the nucleation of Pt. The H2S pretreatment on the SiO2 and TiO2 surfaces significantly delayed the nucleation of Pt on them, while the NH3 pretreatment on the TiO2 surface led to fluent nucleation of Pt. In particular, a continuous Pt film was successfully formed even at an ultrathin thickness of approximately 2.2 nm by NH3 pretreatment. This work suggests that the pretreatment with H2S and NH3 is an efficient way to control the nucleation of Pt in ALD without the support of any reactive species, such as plasma or O-3. Such a strategy enables the easy control of the size and distribution density of Pt nanoparticles for a wide range of applications. English IOP PUBLISHING LTD RU THIN-FILMS PLATINUM NANOPARTICLES NUCLEATION OXIDE INJECTION RUTHENIUM CATALYSTS BEHAVIOR TIO2 NH3 Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment Article 10.1088/0957-4484/26/30/304003 1 NANOTECHNOLOGY, v.26, no.30 NANOTECHNOLOGY 26 30 scie scopus 000358675900004 2-s2.0-84937060992 Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Science & Technology - Other Topics Materials Science Physics Article RU THIN-FILMS PLATINUM NANOPARTICLES NUCLEATION OXIDE INJECTION RUTHENIUM CATALYSTS BEHAVIOR TIO2 NH3 initial growth nucleation behavior atomic layer deposition Pt surface pretreatment