Li, Yi-He Ahn, Kwang-Duk Kim, Dong-Pyo 2024-01-20T07:32:31Z 2024-01-20T07:32:31Z 2022-01-25 2015-03 1042-7147 https://pubs.kist.re.kr/handle/201004/125677 Photosensitive acrylated polyvinylsilazanes were prepared by reacting a diacrylate containing compound, 1,1-bis (acryloyloxyethyl) ethyl isocyanate (BAEI), with polyvinylsilazane (PVSZ) and utilized as an inorganic photoresist for generating SiCN-based ceramic microstructures. The acrylate-modified polymers (m-PVSZ) were characterized by H-1-NMR, C-13-NMR and FT-IR methods to determine the chemical reaction mechanism. Differential photo-calorimeter and FT-IR analysis were employed to examine its photosensitive properties. Line patterns were fabricated by a UV nano-imprinting method; multi-layered octagon structures were fabricated by a two-photon absorption stereolithography process. The results indicate that m-PVSZ is quite a novel inorganic photoresist for the fabrication of micro ceramic structures. Copyright (c) 2015 John Wiley & Sons, Ltd. English WILEY-BLACKWELL INORGANIC POLYMER CERAMIC MICROSTRUCTURES 2-PHOTON POLYMERIZATION FABRICATION LITHOGRAPHY COATINGS FUTURE MEMS Synthesis and properties of UV curable polyvinylsilazane as a precursor for microstructuring Article 10.1002/pat.3448 1 POLYMERS FOR ADVANCED TECHNOLOGIES, v.26, no.3, pp.245 - 249 POLYMERS FOR ADVANCED TECHNOLOGIES 26 3 245 249 scie scopus 000349677000005 2-s2.0-84922811379 Polymer Science Polymer Science Article; Proceedings Paper INORGANIC POLYMER CERAMIC MICROSTRUCTURES 2-PHOTON POLYMERIZATION FABRICATION LITHOGRAPHY COATINGS FUTURE MEMS polyvinylsilazne photoresist UV curing microstructure