Kim, Inho Jeong, Doo Seok Lee, Wook Seong Kim, Won Mok Lee, Taek-Sung Lee, Doh-Kwon Song, Jong-Han Kim, Joon-Kon Lee, Kyeong-Seok 2024-01-20T08:33:43Z 2024-01-20T08:33:43Z 2021-09-02 2014-10-20 1094-4087 https://pubs.kist.re.kr/handle/201004/126230 The use of ultrathin c-Si (crystalline silicon) wafers thinner than 20 mu m for solar cells is a very promising approach to realize dramatic reduction in cell cost. However, the ultrathin c-Si requires highly effective light trapping to compensate optical absorption reduction. Conventional texturing in micron scale is hardly applicable to the ultrathin c-Si wafers; thus, nano scale texturing is demanded. In general, nanotexturing is inevitably accompanied by surface area enlargements, which must be minimized in order to suppress surface recombination of minority carriers. In this study, we demonstrate using optical simulations that periodic c-Si nanodisk arrays of short heights less than 200 nm and optimal periods are very useful in terms of light trapping in the ultrathin c-Si wafers while low surface area enlargements are maintained. Double side texturing with the nanodisk arrays leads to over 90% of the Lambertian absorption limit while the surface area enlargement is kept below 1.5. (C) 2014 Optical Society of America English OPTICAL SOC AMER SOLAR-CELLS ABSORPTION ENHANCEMENT PHOTOVOLTAICS NANOSTRUCTURES ANTIREFLECTION EFFICIENCY Silicon nanodisk array design for effective light trapping in ultrathin c-Si Article 10.1364/OE.22.0A1431 1 OPTICS EXPRESS, v.22, no.21, pp.A1431 - A1439 OPTICS EXPRESS 22 21 A1431 A1439 scie scopus 000344004600006 2-s2.0-84908161945 Optics Optics Article SOLAR-CELLS ABSORPTION ENHANCEMENT PHOTOVOLTAICS NANOSTRUCTURES ANTIREFLECTION EFFICIENCY Ultrathin c-Si wafer Light trapping Solar cells Mie scattering Nanodisk arrays