Kim, Sungman Chun, Dongwon Lee, Jungjoong Jeung, Won Young 2024-01-20T09:02:52Z 2024-01-20T09:02:52Z 2021-09-02 2014-09 0018-9464 https://pubs.kist.re.kr/handle/201004/126434 The influence of substrate bias on the texture control and the performance of CrV underlayer for L1(0) FePt thin films was investigated. CrV(25 nm)/Pt(2 nm)/FePt(7 nm) films were deposited at 300 degrees C using a load-locked ultrahigh vacuum dc magnetron sputter system. During the CrV underlayer deposition, additional RF power (13.56 MHz) was used to apply various negative bias voltages (V = 0 to -60 V) to the substrate; then, its effect on the texture control and performance of the CrV underlayer was investigated. The result of this paper shows that CrV(002) texture control with remarkably increased crystallinity can be achieved without elevating the processing temperature or operating the post-annealing process but by applying suitable substrate bias voltage during the film formation step enabling the CrV thin film to act as an excellent underlayer for upper L1(0) phase FePt layer. English IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC CRYSTALLOGRAPHIC ORIENTATION MAGNETIC-PROPERTIES LOW-TEMPERATURE ENERGY The Influence of Substrate Bias on the Texture Control and Performance of CrV Underlayer for L1(0) FePt Thin Films Article 10.1109/TMAG.2014.2317145 1 IEEE TRANSACTIONS ON MAGNETICS, v.50, no.9 IEEE TRANSACTIONS ON MAGNETICS 50 9 scie scopus 000343036900005 2-s2.0-84957900024 Engineering, Electrical & Electronic Physics, Applied Engineering Physics Article CRYSTALLOGRAPHIC ORIENTATION MAGNETIC-PROPERTIES LOW-TEMPERATURE ENERGY CrV underlayer FePt films in situ ordering low temperature perpendicular magnetic recording media substrate bias voltage