Shin, Ju-Hyeon Go, Bit-Na Choi, Hak-Jong Cho, Joong-Yeon Lee, Albert Sung Soo Hwang, Seung Sang Cha, Hyuk Jin Lee, Heon 2024-01-20T09:04:29Z 2024-01-20T09:04:29Z 2021-09-05 2014-08 2050-7526 https://pubs.kist.re.kr/handle/201004/126518 UV-curable polysilsesquioxane materials were used to incorporate moth-eye structures on photovoltaic (PV) protective glass. These patterns were formed using a hybrid nanoimprint lithography technique and annealed at 100 degrees C to evaporate the solvent (xylene). Compared to the bare, un-patterned PV protective glass, the PV protective glass patterned on both sides had superior optical properties. Transmittance of the PV protective glass patterned on both sides increased by up to 3.13% and reflectance decreased by up to 3.42%, and the transmittance was increased for all angles of incidence. Furthermore, the JSC of devices with the PV protective glass patterned on both sides increased by up to 3.15%. Finally, a monitoring system was set up to measure electricity generated by PV modules. The efficiency of the PV module with PV protective glass patterned on both sides was enhanced by up to 12.16% compared with that of the PV module with un-patterned PV protective glass. English ROYAL SOC CHEMISTRY SILICON SOLAR-CELLS INTERFERENCE LITHOGRAPHY EFFICIENCY OPTIMIZATION LIGHT Fabrication of functional nanosized patterns with UV-curable polysilsesquioxane on photovoltaic protective glass substrates using hybrid nano-imprint lithography Article 10.1039/c4tc00101j 1 JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.29, pp.5864 - 5869 JOURNAL OF MATERIALS CHEMISTRY C 2 29 5864 5869 scie scopus 000339396700017 2-s2.0-84903954162 Materials Science, Multidisciplinary Physics, Applied Materials Science Physics Article SILICON SOLAR-CELLS INTERFERENCE LITHOGRAPHY EFFICIENCY OPTIMIZATION LIGHT UV-curable polysilsesquioxane photovoltaic nanoimprint lithography patterned potective glass