Jeong, Hee Jin Kim, Ho Young Jeong, Seung Yol Han, Joong Tark Baeg, Kang-Jun Hwang, Jun Yeon Lee, Geon-Woong 2024-01-20T11:00:20Z 2024-01-20T11:00:20Z 2021-09-05 2014-01 0008-6223 https://pubs.kist.re.kr/handle/201004/127295 Clean chemical vapor deposition (CVD)-grown graphene surfaces with intrinsic electrical properties were obtained by a modified poly(methylmethacrylate) (PMMA) transfer method. The modified method entails UV irradiation, followed by wet cleaning of the UV-irradiated PMMA layer using a mixture of isopropyl alcohol (IPA), acetone, and methyl isobutyl ketone (MIBK). The chemical structure of the PMMA layer degrades following UV irradiation under atmospheric conditions, via side-chain cleavage of the ester groups, resulting in reduced intermolecular interactions between the PMMA layer and the underlying graphene film. Furthermore, the IPA/MIBK/acetone mixture is shown to be a powerful solvent that can effectively remove the PMMA layer without leaving any PMMA residue, which could act as a source of cracks and scattering centers for charge carrier transport, on the graphene surface. Graphene transistors fabricated by this modified transfer method show high electron and hole mobilities with ideal threshold voltages of near 0 V. (C) 2013 Elsevier Ltd. All rights reserved. English PERGAMON-ELSEVIER SCIENCE LTD POLY(METHYL METHACRYLATE) FILMS FABRICATION DEVICES GAS Improved transfer of chemical-vapor-deposited graphene through modification of intermolecular interactions and solubility of poly(methylmethacrylate) layers Article 10.1016/j.carbon.2013.09.050 1 CARBON, v.66, pp.612 - 618 CARBON 66 612 618 scie scopus 000327575200068 2-s2.0-84886780433 Chemistry, Physical Materials Science, Multidisciplinary Chemistry Materials Science Article POLY(METHYL METHACRYLATE) FILMS FABRICATION DEVICES GAS graphene CVD electrical property microstructure