Povstugar, Ivan Choi, Pyuck-Pa Tytko, Darius Ahn, Jae-Pyeong Raabe, Dierk 2024-01-20T11:01:30Z 2024-01-20T11:01:30Z 2022-01-25 2013-12 1359-6454 https://pubs.kist.re.kr/handle/201004/127353 Microstructural and compositional changes in TiAlN/CrN multilayered films occurring at temperatures up to 1000 degrees C were studied at different length scales by a combination of atom probe tomography, transmission electron microscopy and X-ray diffraction. We observe the onset of decomposition of the multilayer structure at 700 degrees C via the mechanism of interface-directed spinodal decomposition of TiAlN layers, where Al atoms preferentially move toward the nearest interface and segregate there. The interface-directed mechanism later transforms into isotropic spinodal decomposition and is accompanied by intense interdiffusion between the constituting layers. Distinct compositional gradients across columnar grain boundaries (extending perpendicular to the multilayers) are detected at this stage of decomposition. Drastic differences in decomposition behavior across the film depth were observed at elevated temperatures (800-1000 degrees C): the layered structure completely dissolves in the near-surface part but persists in the regions distant from the surface. The influence of residual stresses caused by the sputter deposition process on the thermally induced evolution of the multilayer thin films is discussed. (C) 2013 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved. English PERGAMON-ELSEVIER SCIENCE LTD Interface-directed spinodal decomposition in TiAlN/CrN multilayer hard coatings studied by atom probe tomography Article 10.1016/j.actamat.2013.08.028 1 ACTA MATERIALIA, v.61, no.20, pp.7534 - 7542 ACTA MATERIALIA 61 20 7534 7542 N scie scopus 000328179700002 2-s2.0-84886299681 Materials Science, Multidisciplinary Metallurgy & Metallurgical Engineering Materials Science Metallurgy & Metallurgical Engineering Article THERMAL-STABILITY THIN-FILMS SUPERLATTICE COATINGS SUPERHARD COATINGS N SYSTEM STRESS OXIDATION LAYER TEMPERATURE BEHAVIOR Multilayer thin films Nitrides Atom probe tomography (APT) Spinodal decomposition Residual stresses