Son, Jeong Gon Gotrik, Kevin W. Ross, C. A. 2024-01-20T13:34:29Z 2024-01-20T13:34:29Z 2021-09-04 2012-11 2161-1653 https://pubs.kist.re.kr/handle/201004/128740 A perpendicular orientation of high-aspect-ratio polystyrene-block-polydimethylsiloxane (PS-b-PDMS) cylindrical and lamellar PDMS microdomains was achieved by solvent annealing and then slowly drying thick PS-b-PDMS films. Perpendicularly oriented microdomains occurred throughout the film thickness, except at the air interface, where a layer of in-plane microdomains formed due to the surface energy difference between PS and PDMS. In contrast, thermal annealing produced in-plane orientation throughout the film thickness. The solvent-annealed perpendicular orientation was observed for cylindrical morphology PS-b-PDMS of 16 and 45 kg/mol, where PDMS is the minority block, and lamellar PS-b-PDMS of 43 kg/mol. To obtain fully perpendicular microdomain patterns, a nonselective high-powered 450 W CF4/O-2 reactive ion etching process was performed to remove the top layer of the films. Substrate patterning using electron beam lithography produced local registration of 17 nm period hexagonal cylinder patterns. English AMER CHEMICAL SOC BLOCK-COPOLYMER PATTERNS ARRAYS TEMPLATES LITHOGRAPHY MORPHOLOGY High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing Article 10.1021/mz300475g 1 ACS MACRO LETTERS, v.1, no.11, pp.1279 - 1284 ACS MACRO LETTERS 1 11 1279 1284 scie scopus 000311522200013 2-s2.0-84870018710 Polymer Science Polymer Science Article BLOCK-COPOLYMER PATTERNS ARRAYS TEMPLATES LITHOGRAPHY MORPHOLOGY