Shi, Jianmin Lee, Doh-Kwon Yoo, Han-Ill Janek, Juergen Becker, Klaus-Dieter 2024-01-20T14:01:50Z 2024-01-20T14:01:50Z 2021-08-31 2012-10 1463-9076 https://pubs.kist.re.kr/handle/201004/128854 The oxidation kinetics of nitrogen doped, oxygen deficient titanium dioxide thin films has been studied in atmospheres of pure oxygen or nitrogen at 500 degrees C, 550 degrees C, and 600 degrees C, respectively, by means of in situ optical spectroscopy. The thin films show high electronic absorbance in the visible and NIR region, accompanied by a red shift of the absorption edge of about 0.4 eV, e.g., from about 2.9 to 2.5 eV at 600 degrees C. The time dependent decrease of absorbance due to oxidation is found to follow a parabolic rate law. An activation energy of about 1.96 eV can be obtained from the temperature dependence of the parabolic oxidation rate constant. In the framework of a microscopic oxidation model, this energy barrier is attributed to the diffusion of titanium interstitials in the re-oxidized part of the thin films as a rate-determining process. In addition, an attempt is made to evaluate the kinetics of nitrogen release from the time dependent blue shift of the absorption edge during re-oxidation. English ROYAL SOC CHEMISTRY VISIBLE-LIGHT PHOTOCATALYSIS OPTICAL IN-SITU ELECTRICAL-CONDUCTIVITY OXYGEN NONSTOICHIOMETRY EQUILIBRATION KINETICS CHEMICAL DIFFUSION DEFECT CHEMISTRY ANATASE TIO2 BAND-GAP SURFACE Oxidation kinetics of nitrogen doped TiO2-delta thin films Article 10.1039/c2cp42559a 1 PHYSICAL CHEMISTRY CHEMICAL PHYSICS, v.14, no.37, pp.12930 - 12937 PHYSICAL CHEMISTRY CHEMICAL PHYSICS 14 37 12930 12937 scie scopus 000308101100029 2-s2.0-84865709986 Chemistry, Physical Physics, Atomic, Molecular & Chemical Chemistry Physics Article VISIBLE-LIGHT PHOTOCATALYSIS OPTICAL IN-SITU ELECTRICAL-CONDUCTIVITY OXYGEN NONSTOICHIOMETRY EQUILIBRATION KINETICS CHEMICAL DIFFUSION DEFECT CHEMISTRY ANATASE TIO2 BAND-GAP SURFACE nitroge-doped TiO2 NTO photoelectrode oxidation kinetics