Tamboli, Sikandar H. Rahman, Gul Joo, Oh-Shim 2024-01-20T15:02:14Z 2024-01-20T15:02:14Z 2021-09-05 2012-04-15 0925-8388 https://pubs.kist.re.kr/handle/201004/129331 Nanostructured iron oxide thin films have been prepared by electrodeposition technique and annealed at various temperatures. The effect of deposition potential, deposition time and annealing temperature on photoelectrochemical (PEC) properties of alpha-Fe2O3 thin films was studied. The (1 0 4) and (1 1 0) peak presence in X-ray diffraction patterns confirms alpha-Fe2O3 phase formation. The transition on surface morphology from nanosheets to elongated dumbbell shaped nanoparticles occurred that can be attributed to annealing temperature varied from 400 to 700 degrees C. Optical band gap variation was observed due to annealing temperature. It was found that increment in film thickness increases the photocurrent from 253 mu A/cm(2) to 488 mu A/cm(2) at 0.4 V vs Ag/AgCl. (C) 2012 Elsevier B.V. All rights reserved. English ELSEVIER SCIENCE SA CHEMICAL-VAPOR-DEPOSITION WATER OXIDATION ALPHA-FE2O3 FILMS SPRAY-PYROLYSIS HEMATITE GROWTH Influence of potential, deposition time and annealing temperature on photoelectrochemical properties of electrodeposited iron oxide thin films Article 10.1016/j.jallcom.2012.01.028 1 JOURNAL OF ALLOYS AND COMPOUNDS, v.520, pp.232 - 237 JOURNAL OF ALLOYS AND COMPOUNDS 520 232 237 scie scopus 000300841600037 2-s2.0-84857635180 Chemistry, Physical Materials Science, Multidisciplinary Metallurgy & Metallurgical Engineering Chemistry Materials Science Metallurgy & Metallurgical Engineering Article CHEMICAL-VAPOR-DEPOSITION WATER OXIDATION ALPHA-FE2O3 FILMS SPRAY-PYROLYSIS HEMATITE GROWTH Electrodeposition Hematite Thin film Photoelectrochemical cell