Kim, Yong Hyun Kim, Jin Soo Jeong, Jeung-Hyun Park, Jong-Keuk Baik, Young Joon Lee, Kyeong-Seok Cheong, Byung-Ki Kim, Donghwan Seong, Tae-Yeon Kim, Won Mok 2024-01-20T15:03:58Z 2024-01-20T15:03:58Z 2021-09-04 2012-04 1533-4880 https://pubs.kist.re.kr/handle/201004/129404 ZnO films co-doped with fluorine and hydrogen were prepared on Corning glass by radio frequency magnetron sputtering of ZnO targets with varying amounts of ZnF2 in H-2/Ar gas mixtures of varying H-2 content. The ZnO films' electrical, optical, and structural properties in combination with their compositional properties were investigated. A small addition of H-2 to the sputtering gas caused a drastic increase of Hall mobility with a marginal increase in carrier concentration, indicating an effective passivation of grain boundaries due to hydrogenation. For further increase of H-2 in sputter gas, the Hall mobility remained at a relatively constant level while the carrier concentration increased steadily. Most of the ZnO films co-doped with fluorine and hydrogen showed average transmittance higher than 83% in the 400-800 nm range, while the average absorption coefficients were lower than 600 cm(-1), implying very low absorption loss in these films. It was discovered that the fabrication of ZnO films with a Hall mobility higher than 40 cm(2)/Vs and a very low absorption loss in the visible range is possible by co-doping hydrogen and fluorine. English AMER SCIENTIFIC PUBLISHERS SILICON SOLAR-CELLS AL FILMS DEPOSITION SEMICONDUCTORS Properties of ZnO Thin Films Co-Doped with Hydrogen and Fluorine Article 10.1166/jnn.2012.5627 1 JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.12, no.4, pp.3665 - 3668 JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY 12 4 3665 3668 scie scopus 000305850900143 2-s2.0-84863322883 Chemistry, Multidisciplinary Nanoscience & Nanotechnology Materials Science, Multidisciplinary Physics, Applied Physics, Condensed Matter Chemistry Science & Technology - Other Topics Materials Science Physics Article; Proceedings Paper SILICON SOLAR-CELLS AL FILMS DEPOSITION SEMICONDUCTORS Doped ZnO Fluorine Hydrogen rf Magnetron Sputtering Transparent Conducting Oxide